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Homoepitaxial growth of CoSi2 and NiSi2 on (100) and (110) surfaces at room temperature
Tung, R. T., Schrey, F., Yalisove, S. M.Volume:
55
Year:
1989
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.102338
File:
PDF, 622 KB
english, 1989