[IRE 1985 International Electron Devices Meeting - ()] 1985 International Electron Devices Meeting - VLSI Local interconnect level using titanium nitride
Thomas Tang,, Che-Chia Wei,, Haken, R., Holloway, T., Chang-Feng Wan,, Douglas, M.Year:
1985
Language:
english
DOI:
10.1109/iedm.1985.191041
File:
PDF, 295 KB
english, 1985