![](/img/cover-not-exists.png)
Ferroelectric SrBi[sub 2]Ta[sub 2]O[sub 9] thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode
Seong, Nak-Jin, Choi, Eun-Suck, Yoon, Soon-GilVolume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581554
File:
PDF, 565 KB
english, 1999