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[IEEE 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Las Vegas, NV, USA (2008.09.30-2008.10.3)] 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Total temperature fluctuation of a patternned wafer in the millisecond annealing
Kubo, T., Sukegawa, T., Kase, M.Year:
2008
Language:
english
DOI:
10.1109/rtp.2008.4690555
File:
PDF, 3.83 MB
english, 2008