The origin of defects in SiO2 thermally grown on Czochralski silicon substrates
Itsumi, Manabu, Tomita, Masato, Yamawaki, MasatakaVolume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360232
File:
PDF, 711 KB
english, 1995