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Fracture toughness of low-pressure chemical-vapor-deposited polycrystalline silicon carbide thin films
Hatty, V., Kahn, H., Trevino, J., Zorman, C. A., Mehregany, M., Ballarini, R., Heuer, A. H.Volume:
99
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2158135
File:
PDF, 711 KB
english, 2006