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Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopy
Shallenberger, J. R., Cole, D. A., Novak, S. W.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582038
File:
PDF, 396 KB
english, 1999