Characterization and removal of silicon surface residue...

Journal of Applied Physics 1994 Vol. 76; Iss. 8

Characterization and removal of silicon surface residue resulting from CHF3/C2F6 reactive ion etching

Park, Hyung-Ho, Kwon, Kwang-Ho, Lee, Jong-Lam, Suh, Kyung-Soo, Kwon, Oh-Joon, Cho, Kyoung-Ik, Park, Sin-Chong
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Volume:
76
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.357294
File:
PDF, 980 KB
english, 1994
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