[IEEE IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Munich, Germany (31 March-1 April 2003)] Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI - Fault detection and isolation for plasma etching using model-based approach
Mu-Huo Cheng,, Huan-Shin L,, Shin-Yeu Lin,, Chun-Hung Liu,, Wen-Yo Lee,, Chia-Hung Tsai,Year:
2003
Language:
english
DOI:
10.1109/asmc.2003.1194494
File:
PDF, 359 KB
english, 2003