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Optimizing the dielectric performance of TiO[sub 2] thin films through control of plasma-enhanced chemical vapor deposition process conditions
Yang, Wenli, Monson, Alexander, Marino, Joseph, Wolden, Colin A.Volume:
25
Year:
2007
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2484649
File:
PDF, 353 KB
english, 2007