Carbonitriding of silicon using plasma focus device
Jabbar, S., Khan, I. A., Ahmad, R., Zakaullah, M., Pan, J. S.Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3085720
File:
PDF, 1.32 MB
english, 2009