Growth of controllable ZnO film by atomic layer deposition...

Journal of Applied Physics 2012 Vol. 112; Iss. 12

Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment

Huang, Hsin-Wei, Chang, Wen-Chih, Lin, Su-Jien, Chueh, Yu-Lun
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Volume:
112
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4768839
File:
PDF, 2.16 MB
english, 2012
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