Hydrogen content and density of plasma-deposited amorphous silicon-hydrogen
Fritzsche, H., Tanielian, M., Tsai, C. C., Gaczi, P. J.Volume:
50
Year:
1979
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.326326
File:
PDF, 588 KB
english, 1979