Chemical and structural properties of atomic layer deposited La[sub 2]O[sub 3] films capped with a thin Al[sub 2]O[sub 3] layer
Li, X. L., Tsoutsou, D., Scarel, G., Wiemer, C., Capelli, S. C., Volkos, S. N., Lamagna, L., Fanciulli, M.Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3079632
File:
PDF, 742 KB
english, 2009