Extremely scaled high-k/In0.53Ga0.47As gate stacks with low leakage and low interface trap densities
Chobpattana, Varistha, Mikheev, Evgeny, Zhang, Jack Y., Mates, Thomas E., Stemmer, SusanneVolume:
116
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4896494
Date:
September, 2014
File:
PDF, 1.73 MB
english, 2014