Si interstitial contribution of F[sup +] implants in...

Journal of Applied Physics 2008 Vol. 103; Iss. 9

Si interstitial contribution of F[sup +] implants in crystalline Si

López, Pedro, Pelaz, Lourdes, Duffy, R., Meunier-Beillard, P., Roozeboom, F., van der Tak, K., Breimer, P., van Berkum, J. G. M., Verheijen, M. A., Kaiser, M.
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Volume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2917297
File:
PDF, 603 KB
english, 2008
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