Effect of water absorption of dielectric underlayers on crystal orientation in Al–Si–Cu/Ti/TiN/Ti metallization
Yoshida, Tomoyuki, Hashimoto, Shoji, Hosokawa, Hideki, Ohwaki, Takeshi, Mitsushima, Yasuichi, Taga, YasunoriVolume:
81
Year:
1997
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.365269
File:
PDF, 782 KB
english, 1997