[IEEE 2006 International Electron Devices Meeting - San Francisco, CA, USA (2006.12.11-2006.12.13)] 2006 International Electron Devices Meeting - Integration of Sub-melt Laser Annealing on Metal Gate CMOS Devices for Sub 50 nm Node DRAM
Buh, Gyoung Ho, Yon, Guk-Hyon, Park, Tai-su, Lee, Jin-Wook, Kim, Jihyun, Wang, Yun, Feng, Lucia, Wang, Xiaoru, Shin, Yu Gyun, Choi, Siyoung, Chung, U-In, Moon, Joo-Tae, Ryu, Byung-IlYear:
2006
Language:
english
DOI:
10.1109/iedm.2006.346918
File:
PDF, 829 KB
english, 2006