Diffusion of Sb, Ga, Ge, and (As) in TiSi2
Gas, P., Scilla, G., Michel, A., LeGoues, F. K., Thomas, O., d’Heurle, F. M.Volume:
63
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.340399
File:
PDF, 1.61 MB
english, 1988