Anomalous carrier profiles in BF+2-ion-implanted silicon

Journal of Applied Physics 1979 Vol. 50; Iss. 9

Anomalous carrier profiles in BF+2-ion-implanted silicon

Wada, Yasuo, Hashimoto, Norikazu
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Volume:
50
Year:
1979
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.326762
File:
PDF, 606 KB
english, 1979
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