Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
Bera, Kallol, Rauf, Shahid, Ramaswamy, Kartik, Collins, KenVolume:
106
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3183946
File:
PDF, 1.16 MB
english, 2009