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Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation
Tu, Wen-Ting, Wang, Chih-Hsiung, Huang, Ya-Yun, Lin, Wen-ChinVolume:
109
Year:
2011
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3537832
File:
PDF, 3.10 MB
english, 2011