PECVD SiO/sub 2/ dielectric for niobium Josephson IC process
Lee, S.Y., Nandakumar, V., Murdock, B., Hebert, D.Volume:
27
Language:
english
Journal:
IEEE Transactions on Magnetics
DOI:
10.1109/20.133874
Date:
March, 1991
File:
PDF, 607 KB
english, 1991