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Photodissociation of dimethylaluminum hydride on Si(100) at 193 nm studied by x-ray photoelectron spectroscopy
Ohashi, Masafumi, Shogen, Satoshi, Kawasaki, Masahiro, Hanabusa, MitsuguVolume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.352933
File:
PDF, 904 KB
english, 1993