Relationship between resist performance and reaction order...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 1993 / 11 Vol. 11; Iss. 6

Relationship between resist performance and reaction order in a chemically amplified resist system

Fedynyshyn, Theodore H.
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Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586605
Date:
November, 1993
File:
PDF, 1.23 MB
english, 1993
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