Enhanced tail diffusion of ion implanted boron in silicon

Applied Physics Letters 1987 Vol. 50; Iss. 24

Enhanced tail diffusion of ion implanted boron in silicon

Fan, D., Huang, J., Jaccodine, R. J., Kahora, P., Stevie, F.
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Volume:
50
Year:
1987
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.97735
File:
PDF, 475 KB
english, 1987
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