Coprecipitation of oxygen and carbon in Czochralski silicon: A growth kinetic approach
Huh, J.-Y., Gösele, U., Tan, T. Y.Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360594
File:
PDF, 1.55 MB
english, 1995