Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2005 Vol. 23; Iss. 1
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Scanning spreading resistance microscopy of two-dimensional diffusion of boron implanted in free-standing silicon nanostructures
Kluth, S. M., Álvarez, D., Trellenkamp, St., Moers, J., Mantl, S., Kretz, J., Vandervorst, W.Volume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1839898
File:
PDF, 478 KB
english, 2005