Hydrogen in low-pressure chemical-vapor-deposited silicon (oxy)nitride films
Habraken, F. H. P. M., Tijhaar, R. H. G., van der Weg, W. F., Kuiper, A. E. T., Willemsen, M. F. C.Volume:
59
Year:
1986
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.336651
File:
PDF, 885 KB
english, 1986