Hydrogen in low-pressure chemical-vapor-deposited silicon...

Hydrogen in low-pressure chemical-vapor-deposited silicon (oxy)nitride films

Habraken, F. H. P. M., Tijhaar, R. H. G., van der Weg, W. F., Kuiper, A. E. T., Willemsen, M. F. C.
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Volume:
59
Year:
1986
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.336651
File:
PDF, 885 KB
english, 1986
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