[IEEE IEEE International Integrated Reliability Workshop, 1996. - Lake Tahoe, CA, USA (Oct. 20-23, 1996)] 1996 International Integrated Reliability Workshop Final Report - Impact of boron penetration at the p/sup +/-poly/gate-oxide interface on the device reliability of deep submicron CMOS logic technology
Nayak, D.K., Ming-Yin Hao,, Rakkhit, R.Year:
1996
Language:
english
DOI:
10.1109/irws.1996.583395
File:
PDF, 178 KB
english, 1996