Comparison of inductively coupled plasma Cl[sub 2] and Cl[sub 4]/H[sub 2] etching of III-nitrides
Cho, HyunVolume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581132
Date:
May, 1998
File:
PDF, 988 KB
english, 1998