Comparison of inductively coupled plasma Cl[sub 2] and...

Comparison of inductively coupled plasma Cl[sub 2] and Cl[sub 4]/H[sub 2] etching of III-nitrides

Cho, Hyun
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581132
Date:
May, 1998
File:
PDF, 988 KB
english, 1998
Conversion to is in progress
Conversion to is failed