Low temperature deposition of hydrogenated nanocrystalline SiC films by helicon wave plasma enhanced chemical vapor deposition
Yu, Wei, Lu, Wanbing, Teng, Xiaoyun, Ding, Wenge, Han, Li, Fu, GuangshengVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3478675
File:
PDF, 885 KB
english, 2010