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[IEEE 2009 IEEE International Reliability Physics Symposium - Montreal, QC, Canada (2009.04.26-2009.04.30)] 2009 IEEE International Reliability Physics Symposium - Process options for improving electromigration performance in 32nm technology and beyond
Aubel, O., Hohage, J., Feustel, F., Hennesthal, C., Mayer, U., Preusse, A., Nopper, M., Lehr, M. U., Boemmels, J., Wehner, S.Year:
2009
Language:
english
DOI:
10.1109/irps.2009.5173361
File:
PDF, 454 KB
english, 2009