Oxidation of Si and TiSi2 thin films in rf oxygen plasma

Journal of Applied Physics 1991 Vol. 69; Iss. 3

Oxidation of Si and TiSi2 thin films in rf oxygen plasma

Pérez-Casero, R., Perrière, J., Enard, J. P., Straboni, A., Vuillermoz, B., Climent, A., Martínez-Duart, J. M.
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Volume:
69
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.347280
File:
PDF, 700 KB
english, 1991
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