Surface interactions of SO[sub 2] and passivation chemistry...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2011 Vol. 29; Iss. 1

Surface interactions of SO[sub 2] and passivation chemistry during etching of Si and SiO[sub 2] in SF[sub 6]/O[sub 2] plasmas

Stillahn, Joshua M., Zhang, Jianming, Fisher, Ellen R.
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3520126
File:
PDF, 902 KB
english, 2011
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