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[IEEE 2008 International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2008.06.1-2008.06.4)] 2008 International Interconnect Technology Conference - Amorphous Ru / Polycrystalline Ru Highly Reliable Stacked Layer Barrier Technology

Ogawa, Shinichi, Tarumi, Nobuaki, Abe, Mitsuhide, Shiohara, Morio, Imamura, Hiroki, Kondo, Seiichi
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Year:
2008
Language:
english
DOI:
10.1109/iitc.2008.4546938
File:
PDF, 996 KB
english, 2008
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