Geometric Variability of Nanoscale Interconnects and Its...

Geometric Variability of Nanoscale Interconnects and Its Impact on the Time-Dependent Breakdown of Cu/Low-$k$ Dielectrics

Lee, Shou-Chung, Oates, Anthony S., Chang, Kow-Ming
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Volume:
10
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2010.2048031
Date:
September, 2010
File:
PDF, 802 KB
english, 2010
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