Atomic layer deposition of GaN using GaCl[sub 3] and NH[sub...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2009 Vol. 27; Iss. 4

Atomic layer deposition of GaN using GaCl[sub 3] and NH[sub 3]

Kim, Oh Hyun, Kim, Dojun, Anderson, Tim
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3106619
File:
PDF, 908 KB
english, 2009
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