Highly selective etching of silicon nitride over silicon and silicon dioxide
Kastenmeier, B. E. E., Matsuo, P. J., Oehrlein, G. S.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582097
File:
PDF, 418 KB
english, 1999