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[IEEE 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) - Santa Fe, NM, USA (6-8 June 1994)] Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) - Correlating Plasma Emissivity And Etch Depth*
Buie, M.J., Pender, J.T., Spindler, H.L., Soniker, J., Brake, M.L., Elta, M.Year:
1994
Language:
english
DOI:
10.1109/plasma.1994.589121
File:
PDF, 114 KB
english, 1994