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Low-temperature large-grain poly-Si direct deposition by microwave plasma enhanced chemical vapor deposition using SiH[sub 4]/Xe
Shindo, Wataru, Sakai, Shigefumi, Tanaka, Hiroaki, Zhong, Chuan Jie, Ohmi, TadahiroVolume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582017
File:
PDF, 484 KB
english, 1999