Study of the effect of layer thickness, beam energy, and metal density on the resistless silicide direct-write electron-beam lithography process for the fabrication of nanostructures
Lavallée, Eric, Beauvais, Jacques, Drouin, Dominique, Corbin, JacquesVolume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582247
File:
PDF, 372 KB
english, 2000