“Dry” Lithography Using Liquid and...

IEEE Transactions on Semiconductor Manufacturing 2004 / 11 Vol. 17; Iss. 4

“Dry” Lithography Using Liquid and Supercritical Carbon Dioxide Based Chemistries and Processes

Hoggan, E.N., Wang, K., Flowers, D., DeSimone, J.M., Carbonell, R.G.
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Volume:
17
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2004.837002
Date:
November, 2004
File:
PDF, 1.61 MB
english, 2004
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