Roughness evolution in thin-film growth of SiO[sub 2] and Nb[sub 2]O[sub 5]
Elsholz, F., Schöll, E., Scharfenorth, C., Seewald, G., Eichler, H. J., Rosenfeld, A.Volume:
98
Year:
2005
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2130521
File:
PDF, 1.27 MB
english, 2005