Characterization of the TiW-GaAs interface after rapid...

Journal of Applied Physics 1989 Vol. 66; Iss. 10

Characterization of the TiW-GaAs interface after rapid thermal annealing

de Potter, M., De Raedt, W., Van Hove, M., Zou, G., Bender, H., Meuris, M., Van Rossum, M.
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Volume:
66
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.343789
File:
PDF, 767 KB
english, 1989
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