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Ionization enhanced annealing in phosphorus implanted silicon
Suski, J., Krynicki, J., Rzewuski, H., Gyulai, J., Loferski, J. J.Volume:
35
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577808238802
Date:
January, 1978
File:
PDF, 267 KB
english, 1978