Growth of titanium silicide on ion-implanted silicon

Growth of titanium silicide on ion-implanted silicon

Révész, P., Gyimesi, J., Zsoldos, É.
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Volume:
54
Year:
1983
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.332237
File:
PDF, 586 KB
english, 1983
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