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Ternary Co[sub x]Fe[sub (1−x)]Si[sub 2] and Ni[sub x]Fe[sub (1−x)]Si[sub 2] formed by ion implantation in silicon
Fetzer, Cs., Dézsi, I., Vantomme, A., Wu, M. F., Jin, S., Bender, H.Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1505673
File:
PDF, 417 KB
english, 2002