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Impact of boron-interstitial clusters on Hall scattering factor in high-dose boron-implanted ultrashallow junctions
Severac, Fabrice, Cristiano, Fuccio, Bedel-Pereira, Elena, Fazzini, Pier Francesco, Lerch, Wilfried, Paul, Silke, Hebras, Xavier, Giannazzo, FilippoVolume:
105
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3079505
File:
PDF, 940 KB
english, 2009