Control of the preferred orientation of AlN thin films by collimated sputtering
Rodrı́guez-Navarro, A.Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581267
Date:
May, 1998
File:
PDF, 346 KB
english, 1998